APA Citation

Fauziyah, S. (2009). Application of Taguchi Method in Optimization of Gate Oxide and Silicide Thickness for 45nm NMOS Device. IJENS Publishers.

Chicago Style Citation

Fauziyah, Salehuddin. Application of Taguchi Method in Optimization of Gate Oxide and Silicide Thickness For 45nm NMOS Device. IJENS Publishers, 2009.

MLA Citation

Fauziyah, Salehuddin. Application of Taguchi Method in Optimization of Gate Oxide and Silicide Thickness For 45nm NMOS Device. IJENS Publishers, 2009.

Warning: These citations may not always be 100% accurate.