Mustapha, N., Omar, M. F., Ismail, A. K., Zainal, J., & Raja Ibrahim, R. K. (2015). Gas Phase Diagnostics during Silicon Carbide Films Deposition Using Very High Frequency - Plasma Enhanced Chemical Vapor Deposition.
Chicago Style CitationMustapha, N., M. F. Omar, A. K. Ismail, J. Zainal, and R. K. Raja Ibrahim. Gas Phase Diagnostics During Silicon Carbide Films Deposition Using Very High Frequency - Plasma Enhanced Chemical Vapor Deposition. 2015.
MLA CitationMustapha, N., et al. Gas Phase Diagnostics During Silicon Carbide Films Deposition Using Very High Frequency - Plasma Enhanced Chemical Vapor Deposition. 2015.
Warning: These citations may not always be 100% accurate.