Ion-assisted sputter deposition and structural characterization of cubic boron nitride
We have grown cubic boron nitride (c-BN) films on silicon (100) substrates by rf magnetron sputter deposition in the presence of an electron cyclotron resonance source (ECR) nitrogen plasma. By applying a negative dc potential to the substrate, we are able to accelerate the nitrogen ions from the EC...
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| Format: | Electronic |
| Language: | Undetermined |
| Published: |
1994.
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A1234.567 |
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