Trench DMOS interface trap characterization by three-terminal charge pumping measurement
The applicability of three-terminal charge pumping (3T-CP) technique to characterize the gate-oxide/Silicon (SiO2/Si) interface in a 45 nm thick SiO2, n-type trench Double-diffused Metal–Oxide–Semiconductor (DMOS) technology transistors is studied. The charge pumping current for process control moni...
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| Main Authors: | , , , |
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| 格式: | Article |
| 语言: | English |
| 出版: |
Elsevier
2012
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| 主题: | |
| 在线阅读: | http://irep.iium.edu.my/27128/ http://irep.iium.edu.my/27128/ http://irep.iium.edu.my/27128/1/S0026271412003150 |
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| 总结: | The applicability of three-terminal charge pumping (3T-CP) technique to characterize the gate-oxide/Silicon (SiO2/Si) interface in a 45 nm thick SiO2, n-type trench Double-diffused Metal–Oxide–Semiconductor (DMOS) technology transistors is studied. The charge pumping current for process control monitor kerf (PCM-Kerf) structures were successfully measured during experiments. The plot shapes and trends are in agreement with previously reported work. A correlation study was performed with the numerical value of charge pumping current and experimental results on PCM-Kerf for a planar DMOS with 4 terminals. The charge pumping measurements showed very high source–drain current after approximately −2 V Vbase value.
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