Reactions in Electrodeposited Cu/Sn and Cu/Ni/Sn Nanoscale Multilayers for Interconnects

Miniaturization of electronic devices has led to the development of 3D IC packages which require ultra-small-scale interconnections. Such small interconnects can be completely converted into Cu-Sn based intermetallic compounds (IMCs) after reflow. In an effort to improve IMC based interconnects, an...

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Bibliographic Details
Main Authors: Chia, P.Y., Haseeb, A.S.M.A., Mannan, S.H.
Format: Article
Published: MDPI 2016
Subjects:
Online Access:http://dx.doi.org/10.3390/ma9060430
http://dx.doi.org/10.3390/ma9060430
http://eprints.um.edu.my/17437/1/HaseebASMA_(2016).pdf
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