Crystallinity and Si-H bonding configuration of nc-Si : H films grown by layer-by-layer (LBL) deposition technique at different RF power
A set of hydrogenated nanocrystalline silicon (nc-Si:H)films prepared in a home-built plasma enhanced chemical vapour deposition (PECVD) system using the layer-by-layer (LBL) deposition technique have been studied. The 13.56 MHZ rf power was varied from 20 to 100 W to study the influence of rf power...
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| Main Authors: | , , |
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| Format: | Article |
| Published: |
2008
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| Subjects: | |
| Online Access: | http://eprints.um.edu.my/7329/ |
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