Properties of a-C:H films deposited in CH4 H2 and CH4he DC plasma
Hydrogenated amorphous carbon (a-C:H) films were deposited using direct-current plasma enhanced chemical vapor deposition (DC PECVD) process. The resulting film properties were studied with respect to the introduction of hydrogen (H2) and helium (He) in methane (CH4) plasma. The analysis techniques...
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| Pengarang-pengarang Utama: | , |
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| Format: | Artikel |
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2009
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| Subjek-subjek: | |
| Capaian Atas Talian: | http://eprints.um.edu.my/7374/ |
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