Deposition of a carbon nanocomposite film using magnetron sputtering
A conventional magnetron sputtering system was used for depositing a conductive nanocomposite film which consisted of diamond-like carbon (DLC) and carbon nanoparticles. The synthesis process was composed of three steps. The first step was the deposition of carbon nanoparticles, which was realized b...
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| நிகழà¯à®¨à®¿à®²à¯ˆ அணà¯à®•à®²à¯: | http://eprints.uthm.edu.my/2474/ http://eprints.uthm.edu.my/2474/1/Deposition_of_a_Carbon_Nanocomposite_Film.pdf |
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| தொகà¯à®ªà¯à®ªà¯: | A conventional magnetron sputtering system was used for depositing a
conductive nanocomposite film which consisted of diamond-like carbon (DLC) and
carbon nanoparticles. The synthesis process was composed of three steps. The first
step was the deposition of carbon nanoparticles, which was realized by operating
the magnetron sputtering source with pure argon at a pressure of 400 mTorr. The
second step was the deposition of a DLC film, which was realized by operating the
magnetron sputtering source with mixture of argon and hydrogen at a pressure of 5
mTorr. The third step was the removal of the DLC film on nanoparticles. The
removal of the DLC film was realized using amixture plasma of argon and oxygen,
which was produced by applyingan rf power to the substrate holder |
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