Correlation between plasma properties and its deposited thin film of RF magnetron sputtering system using Zn target
In the present work, we investigate the fundamental properties of magnetron sputtering plasma using Zn target and its deposited Zn thin film. The magnetron sputtering plasma was produced using radio frequency (RF) power supply and Argon (Ar) as ambient gas. A Langmuir probe was used to collect the c...
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Universiti Tun Hussein Onn Malaysia
2010
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| Capaian Atas Talian: | http://eprints.uthm.edu.my/3014/ |
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