Hussin, R., Kwang, L. C., & Hou, X. (2015). Deposited TiO2 thin films by atomic layer deposition (ALD) for optical properties.
Chicago Style CitationHussin, Rosniza, Leong Choy Kwang, and Xiangui Hou. Deposited TiO2 Thin Films By Atomic Layer Deposition (ALD) for Optical Properties. 2015.
MLA CitationHussin, Rosniza, Leong Choy Kwang, and Xiangui Hou. Deposited TiO2 Thin Films By Atomic Layer Deposition (ALD) for Optical Properties. 2015.
Warning: These citations may not always be 100% accurate.