Deposited TiO2 thin films by atomic layer deposition (ALD) for optical properties
The thin films ceramic oxide can be fabricated by ALD because this technique promises to control the deposition on an atomic scale by sequentially dosing the surface with appropriate chemical precursors, and by promoting surface chemical reactions that are inherently self-limiting. TiO2 has been wid...
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| வடிவமà¯: | Conference or Workshop Item |
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2015
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| பகà¯à®¤à®¿à®•à®³à¯: | |
| நிகழà¯à®¨à®¿à®²à¯ˆ அணà¯à®•à®²à¯: | http://eprints.uthm.edu.my/7315/ http://eprints.uthm.edu.my/7315/1/1124.pdf |
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