Simulation, fabrication and characterization of PMOS transistor device
In a low supply voltage CMOS technology, it is desirable to scale threshold voltage and gate length for improving circuit performance. Therefore, a project has been carried out inside KUiTTHO's microelectronic cleanroom to produce a method that has better l ow power/low voltage current concentr...
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| தலைமை எழà¯à®¤à¯à®¤à®¾à®³à®°à¯: | |
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| வடிவமà¯: | Thesis |
| வெளியீடபà¯à®ªà®Ÿà¯à®Ÿà®¤à¯: |
2006
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| பகà¯à®¤à®¿à®•ளà¯: | |
| நிகழà¯à®¨à®¿à®²à¯ˆ அணà¯à®•லà¯: | http://eprints.uthm.edu.my/813/ http://eprints.uthm.edu.my/813/1/24_Pages_from_SIMULATION%2C_FABRICATION_AND_CHARACTERIZATION_OF_PMOS_TRANSISTOR_DEVICE.pdf |
| கà¯à®±à®¿à®¯à¯€à®Ÿà¯à®•ளà¯: |
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