Studies of the self-assembled growth mechanism on nanocrystalline silicon nanodots
Nanocrystalline silicon (nc-Si) nanodots have been grown on corning glass (7059) substrate using a self-assembly VHF-PECVD method under the following experimental conditions: Fixed deposition temperatures of 300/400 °C, deposition times 30/60 s, plasma power of 10 W, silane gas flow rate of 10 sccm,...
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| Pengarang-pengarang Utama: | , , , |
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| Format: | Artikel |
| Bahasa: | English |
| Diterbitkan: |
Ibnu Sina Institute for Fundamental Science Studies, UTM
2010
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| Subjek-subjek: | |
| Capaian Atas Talian: | http://eprints.utm.my/38423/ http://eprints.utm.my/38423/ http://eprints.utm.my/38423/1/SamsudiSakrani2010_StudiesoftheSelfAssembledGrowthMechanismon.pdf |
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