The effects of gas flow rate and annealing on the morphological properties of zinc oxide nanostructures thin film using chemical vapour deposition process
Zinc Oxide nanostructures thin films have been deposited on glass substrates by using chemical vapour deposition technique at 1000°C assisted by gas blocker. Glass substrates was sputtered by ~5nm of gold to form a catalyst layer on top of glass. Different gas flow rates of 0.05, 0.10, 0.20, 0.40 L/...
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| 格式: | Conference or Workshop Item |
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UTM
2016
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| 在线阅读: | http://eprints.utm.my/67049/ http://eprints.utm.my/67049/ |
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