Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO 2 thin films
TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 °C. The st...
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| Format: | Article |
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Optical Materials
2010
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| Online Access: | http://ac.els-cdn.com/S092534670900216X/1-s2.0-S092534670900216X-main.pdf?_tid=64b518a8-4024-11e2-b8de-00000aacb35d&acdnat=1354853762_3b99b598d7703c25f91263267c0c8afb http://ac.els-cdn.com/S092534670900216X/1-s2.0-S092534670900216X-main.pdf?_tid=64b518a8-4024-11e2-b8de-00000aacb35d&acdnat=1354853762_3b99b598d7703c25f91263267c0c8afb |
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