Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO< sub> 2</sub> thin films
TiO2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 �C. The str...
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| Format: | Article |
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Optical Materials
2010
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| Online Access: | http://ac.els-cdn.com/S092534670900216X/1-s2.0-S092534670900216X-main.pdf?_tid=721e3db2-4024-11e2-8c88-00000aacb35f&acdnat=1354853785_a0c32534188f0e894228f52a0bb9bf3d http://ac.els-cdn.com/S092534670900216X/1-s2.0-S092534670900216X-main.pdf?_tid=721e3db2-4024-11e2-8c88-00000aacb35f&acdnat=1354853785_a0c32534188f0e894228f52a0bb9bf3d |
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