Optimization of inductively coupled plasma dry etching for planar waveguide fabrication / Lim Weng Hong
Optimization of the Inductively Coupled Plasma (ICP) dry etching process parameters has been carried out. Seven main etching characteristics were considered in order to produce good etching quality. These characteristics are glass etching rates, selectivity of chromium to glass etching rate, channel...
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2010
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| Online Access: | http://pendeta.um.edu.my/client/default/search/detailnonmodal/ent:$002f$002fSD_ILS$002f796$002fSD_ILS:796323/one?qu=Optimization+of+inductively+coupled+plasma+dry+etching http://pendeta.um.edu.my/client/default/search/detailnonmodal/ent:$002f$002fSD_ILS$002f796$002fSD_ILS:796323/one?qu=Optimization+of+inductively+coupled+plasma+dry+etching http://studentsrepo.um.edu.my/4307/1/lim_weng_hong.pdf |
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http://studentsrepo.um.edu.my/4307/1/lim_weng_hong.pdf