The first inverter fabrication in UTHM cleanroom using cost effective mask
In MOSFET fabrication process, the process recipe is very important. A good process recipe will produce good MOSFET device. Universiti Tun Hussein Onn Malaysia (UTHM) has setup a cleanroom for ISO Class 100 and Class 1000. However, our cleanroom do not have its own recipe to develop MOSFET device. T...
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| Main Authors: | , , , , |
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| Format: | Conference or Workshop Item |
| Published: |
2007
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| Subjects: | |
| Online Access: | http://eprints.uthm.edu.my/3291/ http://eprints.uthm.edu.my/3291/1/01EEE_04.pdf |
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| Summary: | In MOSFET fabrication process, the process recipe is very important. A good process recipe will produce good
MOSFET device. Universiti Tun Hussein Onn Malaysia (UTHM) has setup a cleanroom for ISO Class 100 and
Class 1000. However, our cleanroom do not have its own recipe to develop MOSFET device. Therefore, it is a
challenge for UTHM research group to develop this recipe. In this work, the first attempt to develop a process
recipe for nMOS inverter has been done, which involved three stages. The first stage was designing and
fabrication of cost effective mask using transparency films with channel length range from 500um to 30um.
Then, the second stage was optimizing the process parameters. Finally, the third stage was fabrication of nMOS
inverter using Modu-lab fabrication toolset. The nMOS inverter was successfully fabricated and this work
becomes a starting point for the UTHM research group to do further research in nanoscale transistor and
Microelectromechanical System (MEMS) device. |
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