Device characterization of 0.21μm CMOS device
The objective of this study was ot measure the electrical characteristics, observe the structure and characterize the material of 0.21μm CMOS devices. The material characterization of the 0.21μm CMOS devices were carried out using FIB milling technique, SEM surface morphology and EDX Analysis. The C...
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| Pengarang-pengarang Utama: | , , |
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| Format: | Artikel |
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Penerbit UTHM
2009
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| Subjek-subjek: | |
| Capaian Atas Talian: | http://eprints.uthm.edu.my/536/ http://eprints.uthm.edu.my/536/1/JST_Vol1_F3.pdf |
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