Influence of TiO2 thin film annealing temperature on electrical properties synthesized by CVD technique
Titanium dioxide (TiO2) thin film deposited onto a glass substrate by varying the parameter of annealing temperature using chemical vapor deposition (CVD) technique to investigate the electrical properties. TiO2 thin film annealed at the temperature of 300°C, 800°C and 1000°C before characterization...
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| Main Authors: | , , , , , |
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| Format: | Conference or Workshop Item |
| Published: |
2015
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| Subjects: | |
| Online Access: | http://eprints.uthm.edu.my/7222/ http://eprints.uthm.edu.my/7222/1/IC3E_2015_submission_181.pdf |
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