The role of silane gas flow rate on PECVD-assisted fabrication of silicon nanowires
Silicon (Si) core–shell nanowires (NWs) were successfully prepared by very high frequency plasma-enhanced chemical vapor deposition technique, and the effect of silane (SiH4) gas flow rates on physicochemical properties of silicon NWs was investigated. Field emission scanning electron microscopy (FE...
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Springer Verlag
2016
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| பகà¯à®¤à®¿à®•à®³à¯: | |
| நிகழà¯à®¨à®¿à®²à¯ˆ அணà¯à®•à®²à¯: | http://eprints.utm.my/73836/ http://eprints.utm.my/73836/ |
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